抄録
Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.
| 本文言語 | English |
|---|---|
| ホスト出版物のタイトル | Proceedings of SPIE - The International Society for Optical Engineering |
| 編集者 | E.A. Dobisz |
| ページ | 789-796 |
| ページ数 | 8 |
| 巻 | 4343 |
| DOI | |
| 出版ステータス | Published - 2001 |
| 外部発表 | はい |
| イベント | Emerging Lithographic Technologies V - Santa Clara, CA, United States 継続期間: 2001 2 27 → 2001 3 1 |
Other
| Other | Emerging Lithographic Technologies V |
|---|---|
| Country | United States |
| City | Santa Clara, CA |
| Period | 01/2/27 → 01/3/1 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics