Optimal lithium targets for laser-plasma lithography

A. A. Andreev, T. Ueda, J. Limpouch

研究成果: Conference contribution

11 被引用数 (Scopus)

抄録

Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

本文言語English
ホスト出版物のタイトルProceedings of SPIE - The International Society for Optical Engineering
編集者E.A. Dobisz
ページ789-796
ページ数8
4343
DOI
出版ステータスPublished - 2001
外部発表はい
イベントEmerging Lithographic Technologies V - Santa Clara, CA, United States
継続期間: 2001 2 272001 3 1

Other

OtherEmerging Lithographic Technologies V
国/地域United States
CitySanta Clara, CA
Period01/2/2701/3/1

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 凝縮系物理学

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