Optimal lithium targets for laser-plasma lithography

A. A. Andreev; T. Ueda; J. Limpouch

doi:10.1117/12.436706

Optimal lithium targets for laser-plasma lithography

A. A. Andreev, T. Ueda, J. Limpouch

研究成果: Conference contribution

11 被引用数 (Scopus)

抄録

Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

本文言語	English
ホスト出版物のタイトル	Proceedings of SPIE - The International Society for Optical Engineering
編集者	E.A. Dobisz
ページ	789-796
ページ数	8
巻	4343
DOI	https://doi.org/10.1117/12.436706
出版ステータス	Published - 2001
外部発表	はい
イベント	Emerging Lithographic Technologies V - Santa Clara, CA, United States 継続期間: 2001 2 27 → 2001 3 1

Other

Other	Emerging Lithographic Technologies V
国/地域	United States
City	Santa Clara, CA
Period	01/2/27 → 01/3/1

ASJC Scopus subject areas

電子工学および電気工学
凝縮系物理学

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AU - Ueda, T.

AU - Limpouch, J.

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AB - Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

KW - Debris reduction

KW - Laser-produced plasmas

KW - Soft x-ray source

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BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Dobisz, E.A.

T2 - Emerging Lithographic Technologies V

Y2 - 27 February 2001 through 1 March 2001

ER -

Optimal lithium targets for laser-plasma lithography

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