Optimization of high average power FEL beam for EUV lithography application

A. Endo, Kazuyuki Sakaue, Masakazu Washio, H. Mizoguchi

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

EUV source community is interested in evaluating an alternative method based on high repetition rate FEL, to avoid a risk of the potential source power limit by the plasma based technology. Present SASE FEL pulse (typically 0.1mJ, 100fs, 1 mm diameter) has higher beam fluence than the resist ablation threshold, and high spatial coherence which results in speckle and interference patterns, and random longitudinal mode spikes of high peak power micro pulses, which is not favourable to resist chemistry. This paper discusses on the required technological assessment and lowest risk approach to construct a prototype, based on superconducting linac and cryogenic undulator, to demonstrate a MHz repetition rate, high average power 13.5nm FEL equipped with specified optical components, for best optimization in EUVL application, including a scaling to 6.7nm wavelength region.

本文言語English
ホスト出版物のタイトルProceedings of the 36th International Free Electron Laser Conference, FEL 2014
出版社Joint Accelerator Conferences Website (JACoW)
ページ990-992
ページ数3
ISBN(電子版)9783954501335
出版ステータスPublished - 2014
イベント36th International Free Electron Laser Conference, FEL 2014 - Basel, Switzerland
継続期間: 2014 8月 252014 8月 29

Other

Other36th International Free Electron Laser Conference, FEL 2014
国/地域Switzerland
CityBasel
Period14/8/2514/8/29

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学

フィンガープリント

「Optimization of high average power FEL beam for EUV lithography application」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル