抄録
We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. Thus, we have established a technology for measuring particle sizes and the constituent element content of particles with 10% accuracy.
本文言語 | English |
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ジャーナル | IEEJ Transactions on Sensors and Micromachines |
巻 | 127 |
号 | 9 |
DOI | |
出版ステータス | Published - 2007 |
ASJC Scopus subject areas
- 電子工学および電気工学
- 機械工学