We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. We have investigated the condition for measuring particle sizes and the constituent element.
|ホスト出版物のタイトル||Proceedings of the SICE Annual Conference|
|出版ステータス||Published - 2005|
|イベント||SICE Annual Conference 2005 - Okayama|
継続期間: 2005 8月 8 → 2005 8月 10
|Other||SICE Annual Conference 2005|
|Period||05/8/8 → 05/8/10|
ASJC Scopus subject areas