Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo Jun Zhang, Takashi Tanii, Takashi Funatsu, Iwao Ohdomari

研究成果: Article

37 引用 (Scopus)

抜粋

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

元の言語English
ページ(範囲)786-787
ページ数2
ジャーナルChemical Communications
4
発行部数7
DOI
出版物ステータスPublished - 2004 1 1

    フィンガープリント

ASJC Scopus subject areas

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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