Photocatalytic reduction of CO 2 with H 2O on Ti-containing porous silica thin film photocatalysts

Keita Ikeue; Shinjiro Nozaki; Makoto Ogawa; Masakazu Anpo

doi:10.1023/A:1015400223708

Photocatalytic reduction of CO ₂ with H ₂O on Ti-containing porous silica thin film photocatalysts

Keita Ikeue, Shinjiro Nozaki, Makoto Ogawa, Masakazu Anpo^*

^*この研究の対応する著者

早稲田大学

研究成果: Article › 査読

82 被引用数 (Scopus)

抄録

Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO ₂ with H ₂O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO ₂ and H ₂O led to the formation of CH ₄ and CH ₃OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.

本文言語	English
ページ（範囲）	111-114
ページ数	4
ジャーナル	Catalysis Letters
巻	80
号	3-4
DOI	https://doi.org/10.1023/A:1015400223708
出版ステータス	Published - 2002 6月

ASJC Scopus subject areas

物理化学および理論化学
触媒

文献へのアクセス

10.1023/A:1015400223708

他のファイルとリンク

引用スタイル

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title = "Photocatalytic reduction of CO 2 with H 2O on Ti-containing porous silica thin film photocatalysts",

abstract = "Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO 2 with H 2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO 2 and H 2O led to the formation of CH 4 and CH 3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.",

keywords = "Formation of CH OH, Mesoporous thin film, Photocatalyst, Quantum yield, Reduction of CO",

author = "Keita Ikeue and Shinjiro Nozaki and Makoto Ogawa and Masakazu Anpo",

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T1 - Photocatalytic reduction of CO 2 with H 2O on Ti-containing porous silica thin film photocatalysts

AU - Ikeue, Keita

AU - Nozaki, Shinjiro

AU - Ogawa, Makoto

AU - Anpo, Masakazu

PY - 2002/6

Y1 - 2002/6

N2 - Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO 2 with H 2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO 2 and H 2O led to the formation of CH 4 and CH 3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.

AB - Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO 2 with H 2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO 2 and H 2O led to the formation of CH 4 and CH 3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.

KW - Formation of CH OH

KW - Mesoporous thin film

KW - Photocatalyst

KW - Quantum yield

KW - Reduction of CO

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