Photochemical reaction of ozone and 1,1,1,3,3,3-hexamethyldisilazane: Analysis of the gas reaction between precursors in a photochemical vapor deposition process

Ken Nakamura, Hidehiko Nonaka, Naoto Kameda, Tetsuya Nishiguchi, Shingo Ichimura

研究成果: Article査読

4 被引用数 (Scopus)

抄録

The photochemical reaction of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) and ozone (O3) in the gas phase was analyzed as the side reaction in the photochemical vapor deposition (photo-CVD) process irradiated by ultraviolet light: the analysis was conducted by Fourier-transform infrared absorption spectroscopy (FT-IR) and mass spectrometry (MS). The final products of this photochemical reaction between HMDS and O3 are CO2, N 2, and H2O, although this reaction is initiated at the Si-N-Si bond of HMDS with O3 and ultraviolet (UV) light, thus producing, as a reaction intermediate, a compound with carbonyl and/or carboxylic group followed by Si-N-Si scission.

本文言語English
ページ(範囲)7349-7355
ページ数7
ジャーナルJapanese journal of applied physics
47
9 PART 1
DOI
出版ステータスPublished - 2008 9 12
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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