Photochemical vapor deposition of amorphous silica films using disilane and perfluorosilanes: Defect structures and deposition mechanism
Hidehiko Nonaka*, Kazuo Arai, Yoshiyuki Fujino, Shingo Ichimura
*この研究の対応する著者
研究成果: Article › 査読
20
被引用数
(Scopus)