Photoluminescence analysis of plasma-deposited oxygen-rich silicon oxynitride films

Takashi Noma*, Kwang Soo Seol, Makoto Fujimaki, Hiromitsu Kato, Takashi Watanabe, Yoshimichi Ohki

*この研究の対応する著者

研究成果: Article査読

12 被引用数 (Scopus)

抄録

Photoluminescence spectra were observed for hydrogenated oxygen-rich silicon oxynitride films with different N/O ratios, deposited by plasma-enhanced chemical vapor deposition. In the sample with a small ratio of N/O, two luminescence bands at 4.4 and 2.7 eV originated from silicon homobonds in SiO2 were observed, while a luminescence band at 2.6-2.9 eV which has very similar properties to the one observed in SiNx was observed in the sample with a large ratio of N/O. The results of Fourier-transform infrared spectroscopy, electron spin resonance, X-ray photoelectron spectroscopy and scanning electron microscopy indicated that the luminescence band at 2.6-2.9 cV results from Si-N bonds in the films and that the present films have regions where Si-N bonds gathered.

本文言語English
ページ(範囲)6587-6593
ページ数7
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
39
12 A
DOI
出版ステータスPublished - 2000 12 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

フィンガープリント

「Photoluminescence analysis of plasma-deposited oxygen-rich silicon oxynitride films」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル