Physical and chemical analytical instruments for failure analyses in G-bit devices

Yasuhiro Mitsui*, Fumiko Yano, Yoshitaka Nakamura, Koji Kimoto, Tsuyoshi Hasegawa, Shigeharu Kimura, Kyoichiro Asayama


研究成果: Conference article査読

15 被引用数 (Scopus)


The current status and future trend of analytical instruments are discussed. Analytical instruments for failure analyses in sub-1/4 micron dimensions or less, require high spatial resolution and sensitivity at atomic levels. Using new analytical instruments, such as the Nano-prober for electrical characteristics inspection in actual circuits, TEM-EELS for chemical bond analysis of nanometer area and GDS for precise composition analysis, it was found that a SiO2 or TiOx film formed by water from titanic acid (TiOxH2O) produced with titan, water and chlorine, was a cause of high resistivity for a contact (CVD-W/CVD-TiN/Ti/Si) in sub-1/4 micron devices.

ジャーナルTechnical Digest - International Electron Devices Meeting
出版ステータスPublished - 1998
イベントProceedings of the 1998 IEEE International Electron Devices Meeting - San Francisco, CA, USA
継続期間: 1998 12月 61998 12月 9

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学
  • 材料化学


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