Physical and chemical analytical instruments for failure analyses in G-bit devices

Yasuhiro Mitsui, Fumiko Yano, Yoshitaka Nakamura, Koji Kimoto, Tsuyoshi Hasegawa, Shigeharu Kimura, Kyoichiro Asayama

研究成果: Conference contribution

14 引用 (Scopus)

抜粋

The current status and future trend of analytical instruments are discussed. Analytical instruments for failure analyses in sub-1/4 micron dimensions or less, require high spatial resolution and sensitivity at atomic levels. Using new analytical instruments, such as the Nano-prober for electrical characteristics inspection in actual circuits, TEM-EELS for chemical bond analysis of nanometer area and GDS for precise composition analysis, it was found that a SiO2 or TiOx film formed by water from titanic acid (TiOxH2O) produced with titan, water and chlorine, was a cause of high resistivity for a contact (CVD-W/CVD-TiN/Ti/Si) in sub-1/4 micron devices.

元の言語English
ホスト出版物のタイトルTechnical Digest - International Electron Devices Meeting
編集者 Anon
出版者IEEE
ページ329-332
ページ数4
出版物ステータスPublished - 1998
外部発表Yes
イベントProceedings of the 1998 IEEE International Electron Devices Meeting - San Francisco, CA, USA
継続期間: 1998 12 61998 12 9

Other

OtherProceedings of the 1998 IEEE International Electron Devices Meeting
San Francisco, CA, USA
期間98/12/698/12/9

    フィンガープリント

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

これを引用

Mitsui, Y., Yano, F., Nakamura, Y., Kimoto, K., Hasegawa, T., Kimura, S., & Asayama, K. (1998). Physical and chemical analytical instruments for failure analyses in G-bit devices. : Anon (版), Technical Digest - International Electron Devices Meeting (pp. 329-332). IEEE.