Picosecond, kW thin disc laser technology for LPP and FEL EUV sources

A. Endo, M. Smrz, O. Novak, H. Turcicova, J. Muzik, J. Huynh, T. Mocek, Kazuyuki Sakaue, Masakazu Washio

研究成果: Conference contribution

抄録

Picosecond, high average power laser is critical in the HVM EUV source technology. 100kHz, mJ, laser is realized by thin disc laser architecture for LPP, and > MHz laser is discussed for 10kW level EUV FEL.

元の言語English
ホスト出版物のタイトルCompact EUV and X-ray Light Sources, EUVXRAY 2016
出版者OSA - The Optical Society
Part F14-EUVXRAY 2016
ISBN(印刷物)9781943580095
出版物ステータスPublished - 2016 3 14
イベントCompact EUV and X-ray Light Sources, EUVXRAY 2016 - Long Beach, United States
継続期間: 2016 3 202016 3 22

Other

OtherCompact EUV and X-ray Light Sources, EUVXRAY 2016
United States
Long Beach
期間16/3/2016/3/22

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Videodisks
Free electron lasers
Light sources
Lasers
High power lasers

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

これを引用

Endo, A., Smrz, M., Novak, O., Turcicova, H., Muzik, J., Huynh, J., ... Washio, M. (2016). Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. : Compact EUV and X-ray Light Sources, EUVXRAY 2016 (巻 Part F14-EUVXRAY 2016). [ES4A.2] OSA - The Optical Society.

Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. / Endo, A.; Smrz, M.; Novak, O.; Turcicova, H.; Muzik, J.; Huynh, J.; Mocek, T.; Sakaue, Kazuyuki; Washio, Masakazu.

Compact EUV and X-ray Light Sources, EUVXRAY 2016. 巻 Part F14-EUVXRAY 2016 OSA - The Optical Society, 2016. ES4A.2.

研究成果: Conference contribution

Endo, A, Smrz, M, Novak, O, Turcicova, H, Muzik, J, Huynh, J, Mocek, T, Sakaue, K & Washio, M 2016, Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. : Compact EUV and X-ray Light Sources, EUVXRAY 2016. 巻. Part F14-EUVXRAY 2016, ES4A.2, OSA - The Optical Society, Compact EUV and X-ray Light Sources, EUVXRAY 2016, Long Beach, United States, 16/3/20.
Endo A, Smrz M, Novak O, Turcicova H, Muzik J, Huynh J その他. Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. : Compact EUV and X-ray Light Sources, EUVXRAY 2016. 巻 Part F14-EUVXRAY 2016. OSA - The Optical Society. 2016. ES4A.2
Endo, A. ; Smrz, M. ; Novak, O. ; Turcicova, H. ; Muzik, J. ; Huynh, J. ; Mocek, T. ; Sakaue, Kazuyuki ; Washio, Masakazu. / Picosecond, kW thin disc laser technology for LPP and FEL EUV sources. Compact EUV and X-ray Light Sources, EUVXRAY 2016. 巻 Part F14-EUVXRAY 2016 OSA - The Optical Society, 2016.
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AU - Huynh, J.

AU - Mocek, T.

AU - Sakaue, Kazuyuki

AU - Washio, Masakazu

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