Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system

Takahiro Arakawa, Yukiko Sato, Taro Ueno, Takashi Funatsu, Shuichi Shoji

    研究成果: Conference contribution

    3 引用 (Scopus)

    抄録

    Useful Pyrex glass etching method using HF and H 2SO 4 mixed acid was studied. To realize the etching behaviors of constant etch rate, high masks durability, small under cut and pinhole free, optimum composition of HF-H 2SO 4 system was found out. Pinhole-free etching, constant etching rate of 0.5 μm/min and smooth surface of less than 4.6nm was obtained at 0.8vol% HF and 32vol% H 2SO 4. This system realized high durability of the etching mask of Si, Cr/Au and even photoresists. This method is useful not only to fabricate Pyrex glass microchannels but also to make PDMS molds. We fabricated a prototype of the pneumatic actuated microvalve system for the single molecular imaging under Total Internal Reflection Fluorescence Microscopy (TIRFM). The leakage free valve actions are confirmed and the switching time of Open-Close and Close-Open modes are 100msec and 120msec respectively.

    元の言語English
    ホスト出版物のタイトルDigest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
    ページ1489-1492
    ページ数4
    2
    DOI
    出版物ステータスPublished - 2005
    イベント13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul
    継続期間: 2005 6 52005 6 9

    Other

    Other13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
    Seoul
    期間05/6/505/6/9

    Fingerprint

    Etching
    Glass
    Acids
    Masks
    Durability
    Molecular imaging
    Fluorescence microscopy
    Molds
    Photoresists
    Microchannels
    Pneumatics
    Chemical analysis

    ASJC Scopus subject areas

    • Engineering(all)

    これを引用

    Arakawa, T., Sato, Y., Ueno, T., Funatsu, T., & Shoji, S. (2005). Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system. : Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05 (巻 2, pp. 1489-1492). [3E4.48] https://doi.org/10.1109/SENSOR.2005.1497365

    Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system. / Arakawa, Takahiro; Sato, Yukiko; Ueno, Taro; Funatsu, Takashi; Shoji, Shuichi.

    Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05. 巻 2 2005. p. 1489-1492 3E4.48.

    研究成果: Conference contribution

    Arakawa, T, Sato, Y, Ueno, T, Funatsu, T & Shoji, S 2005, Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system. : Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05. 巻. 2, 3E4.48, pp. 1489-1492, 13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05, Seoul, 05/6/5. https://doi.org/10.1109/SENSOR.2005.1497365
    Arakawa T, Sato Y, Ueno T, Funatsu T, Shoji S. Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system. : Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05. 巻 2. 2005. p. 1489-1492. 3E4.48 https://doi.org/10.1109/SENSOR.2005.1497365
    Arakawa, Takahiro ; Sato, Yukiko ; Ueno, Taro ; Funatsu, Takashi ; Shoji, Shuichi. / Pinhole-free pyrex glass etching using HF-H 2SO 4 mixed acid and its applications for a PDMS microflow system. Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05. 巻 2 2005. pp. 1489-1492
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    AU - Funatsu, Takashi

    AU - Shoji, Shuichi

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