A device has been fabricated by loading an a-Si:H film on a polymer thin-film optical waveguide via a low index buffer layer. As an application to an optical functional device, this structure has been investigated as to its characteristics as a TE-TM mode waveguide polarizer. The loss characteristics of each mode are studied by varying the thickness of the a-Si:H film for a slab waveguide and for a practically important three-dimensional waveguide (width of 100 μm, 50 μm, 10 μm and 5 μm). The characteristics of the structures as a TE-TM mode waveguide polarizer are investigated.
|ジャーナル||Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi)|
|出版ステータス||Published - 1988 12|
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