Polysilane/polysilazane (PS/PSz) composite is proposed as a novel material for optical waveguides. A refractive index change, as large as about 4.5%, can be induced and automatically built in only by UV exposure without etching and/ or development due to a photochemical reaction, generally known as "photobleaching". To verify the practical performance of the PS/PSz composite for photonic devices with refractive-index-modulated structures, we fabricated optical waveguide mode-conversion filters using polymethylphenylsilane (PMPS)/perhydropolysilazane (PHPSz) composite, and successfully demonstrated its operation in both visible (633 nm) and infrared (1310nm) wavelength ranges. The result shows that the PS/ PSz composite is a promising candidate not only for optical waveguide devices such as those used in CWDM applications, but also for optical interconnections.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|出版ステータス||Published - 2004 8月|
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