Positive-negative dual-tone sensitivities of ZEP resist

Tomoko Gowa Oyama*, Hirotaka Nakamura, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa

*この研究の対応する著者

研究成果: Article査読

4 被引用数 (Scopus)

抄録

A chlorinated resist named ZEP changes from positive- to negative-tone with a high dose of electron beam irradiation. The sensitivities to a 100-kV electron beam as a dual positive- and negative-tone resist are evaluated with various developers. Although the positive-tone sensitivity varies with different developers owing to different solvation strengths, the threshold dose for the positive-negative (P-N) inversion is independent of the developer. According to an analysis using X-ray photoelectron spectroscopy and NMR spectroscopy, the amount of chlorine atoms and terminal double bonds generated by chain scission determines the scission/crosslinking probabilities, i.e., the threshold of the P-N inversion.

本文言語English
論文番号036501
ジャーナルApplied Physics Express
7
3
DOI
出版ステータスPublished - 2014 3月

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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