抄録
We have investigated ion-beam-induced and thermal annealing-induced microstructures in high fluence Fe implanted Si using transmission electron microscopy. Si(1 1 1) substrates were irradiated with 120 keV Fe ions at 120 K to fluences of 0.4 × 1017 and 4.0 × 1017 cm-2. A continuous amorphous layer was formed on Si substrates in both as-implanted samples. After thermal annealing at 1073 K for 2 h, β-FeSi2 fine particles buried in a polycrystalline Si layer were observed in the low fluence sample, while a continuous β-FeSi2 layer was formed in the high fluence sample. We discuss the relationship between ion fluence and defects recovery process in Fe ion implanted Si.
本文言語 | English |
---|---|
ページ(範囲) | 340-343 |
ページ数 | 4 |
ジャーナル | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
巻 | 257 |
号 | 1-2 SPEC. ISS. |
DOI | |
出版ステータス | Published - 2007 4月 |
外部発表 | はい |
ASJC Scopus subject areas
- 核物理学および高エネルギー物理学
- 器械工学