Preferential immobilization of biomolecules on silicon microstructure array by means of electron beam lithography on organosilane self-assembled monolayer resist

Takashi Tanii, Takumi Hosaka, Takeo Miyake, Guo Jun Zhang, Tamotsu Zako, Takashi Funatsu, Iwao Ohdomari

研究成果: Conference article査読

26 被引用数 (Scopus)

抄録

A novel fabrication process of silicon microstructure array for preferential immobilization of biomolecules is proposed. We perform electron beam lithography on a self-assembled monolayer (SAM), and achieve high-density silicon patterns terminated with both 3-aminopropyltriethoxysilane (APTES) and octadecyltrimethoxysilane (ODS). The amino-terminated surface produces the site-directed covalent immobilization of DNA inside the pattern, while the hydrophobic surface of the ODS-SAM prevents the adsorption. As a result, we have succeeded in immobilizing the DNA within the amino-modified area. By using this methodology, we demonstrate the miniaturization of deoxyribonucleic acid (DNA) chip. After the covalent attachment of the amino-modified oligonucleotides to the microstructures, we hybridize the immobilized DNA with the target DNA labeled with a fluorescent dye. The signals from the DNA chip exhibit the specific binding due to the DNA-DNA interaction. These results show the feasibility of this technique for high-density information storage and biochip miniaturization.

本文言語English
ページ(範囲)102-106
ページ数5
ジャーナルApplied Surface Science
234
1-4
DOI
出版ステータスPublished - 2004 7 15
イベントThe Ninth International Conference on the Formation of Semicon - Madrid, Spain
継続期間: 2003 9 152003 9 19

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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