Preparation of aluminum-containing self-standing mesoporous silica films

Naoki Shimura, Makoto Ogawa*

*この研究の対応する著者

研究成果: Article査読

9 被引用数 (Scopus)

抄録

Siliceous and aluminum-containing self-standing mesoporous silica films with the thickness of ca. 50 μm were synthesized by the solvent evaporation method from tetramethoxysilane, aluminum chloride hexahydrate, and octadecyltrimethylammonium chloride. The films possessed highly ordered mesostructures and large surface areas (over ca. 700 m2 g -1). The mesostructures of the products were controlled by the chemical compositions (Si/surfactant); siliceous mesostructured materials With hexagonal (P6m) and cubic (Pm3n) phases were obtained when the molar Si/surfactant ratios were 9 and 8, respectively. The aluminum-containing films with the molar Si/Al ratios of 50, 20, and 10 were also synthesized.

本文言語English
ページ(範囲)1599-1606
ページ数8
ジャーナルBulletin of the Chemical Society of Japan
77
8
DOI
出版ステータスPublished - 2004 8

ASJC Scopus subject areas

  • 化学 (全般)

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