Preparation of electrodeposited Pt nano patterned electrode using UV-nano imprinting lithography

M. Saito, J. Mizuno, H. Nishikubo, H. Fujiwara, T. Homma

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

We attempt to prepare the patterned electrode for the formation of nano particles using electrochemical deposition with the cathode whose surface has nano dot patterns. In particular, we applied electrodeposition of Pt and UV nano imprinting lithography (UV-NIL) to prepare the nano patterned electrode. In order to achieve higher activity, the deposition condition of Pt was optimized using additives such as polyethylene glycol (PEG). The surface activity of the Pt films was affected by molecular weight of PEG. It was revealed that the surface activity of the films deposited with the order of thousands of molecular weight of PEG indicated the highest effective current density among the examined films. The Pt films, which exhibited the highest current density, were adapted to fabricate nano-patterned electrode with 400 nm pith periodic structure using UV-NIL.

本文言語English
ホスト出版物のタイトルECS Transactions - Nanotechnology - General - 214th ECS Meeting/PRiME 2008
ページ131-136
ページ数6
25
DOI
出版ステータスPublished - 2009 11 23
イベントNanotechnology - General - 214th ECS Meeting/PRiME 2008 - Honolulu, HI, United States
継続期間: 2008 10 122008 10 17

出版物シリーズ

名前ECS Transactions
番号25
16
ISSN(印刷版)1938-5862
ISSN(電子版)1938-6737

Conference

ConferenceNanotechnology - General - 214th ECS Meeting/PRiME 2008
国/地域United States
CityHonolulu, HI
Period08/10/1208/10/17

ASJC Scopus subject areas

  • 工学(全般)

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