Preparation of high-Bs Co-Fe soft magnetic thin films by electrodeposition

Tokihiko Yokoshima*, Kenta Imai, Toshiki Hiraiwa, Tetsuya Osaka

*この研究の対応する著者

研究成果: Article査読

17 被引用数 (Scopus)

抄録

Co-Fe soft magnetic thin films with high-saturation magnetic flux density Bs were prepared by electrodeposition. The Bs value of the Co-Fe alloy films deposited from the conventional cell system is lower than that of bulk alloys. With the use of a separated compartment dual cell system, the Bs value of the Co-Fe alloy films was reached the same as that of bulk alloy. The coercivity Hc values were higher than 12 Oe; however, the Hc value could be lowered to 8 Oe by annealing in vacuum with an applied magnetic field. It is suggested that decreasing Hc of the films by annealing is caused by relaxation of lattice distortion. In addition, the high-Bs Co-Fe films show good corrosion resistance.

本文言語English
ページ(範囲)2332-2334
ページ数3
ジャーナルIEEE Transactions on Magnetics
40
4 II
DOI
出版ステータスPublished - 2004 7月

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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