Preparation of phenylsilsesquioxane films from phenylsilsesquiazane possessing Si-N backbones

Noriko Imanari, Yoshiyuki Sugahara*

*この研究の対応する著者

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Phenylsilsesquiazane (PhSSz) prepared by ammonolysis of phenyltrichlorosilane was spin-coated on Si(100) substrates. The resulting PhSSz films were subsequently converted into phenylsilsesquioxane films via hydrolysis in an autoclave under various hydrothermal conditions. IR spectroscopy revealed that the relative intensities of Si-N-Si and N-H stretching bands decreased, while a Si-O-Si stretching band appeared. Upon heating at 160 °C for 72 h with 0.5 mL of water, PhSSz was completely converted into phenylsilsesquioxane. Another poysiloxane film was obtained from a polysilazane prepared by ammonolysis of a mixture of phenyltrichlorosilane and trichlorosilane (PhHSSz). FE-SEM and AFM observations revealed that the phenylsilsesquioxane film and the poysiloxane film had dense structures and smooth surfaces.

本文言語English
ページ(範囲)195-199
ページ数5
ジャーナルScience of Advanced Materials
2
2
DOI
出版ステータスPublished - 2010 6月 1

ASJC Scopus subject areas

  • 材料科学(全般)

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