Preparation of YSZ thin films by RF plasma-enhanced metal organic chemical vapor depodition

Takashi Nishimura*, Takamichi Ichikawa, Nagahiro Saito, Akio Fuwa

*この研究の対応する著者

    研究成果: Conference contribution

    抄録

    Yttria-stabilized zirconia (YSZ) has high potential to be used as solid-oxide fuel cell (SOFC) electrolyte. However, the high efficiency of SOFC has not been yet achieved due to the high internal resistance of bulk electrolyte. The resistance becomes lower with the decrease in the electrolyte thickness. Thus, the decrease in electrolyte thickness leads to lower internal resistance. The aim of this study is as follows: (a) to prepare the thin films of YSZ by inductively-coupled RF plasma-enhanced metal organic chemical vapor deposition (PEMOCVD) process using Zr(t-OC4H9)4, Y(DPM)3 and oxygen, and (b) to reveal the relationship between the structural characterizations and the process parameters.

    本文言語English
    ホスト出版物のタイトルProceedings of the Second International Conference on Processing Materials for Properties
    編集者B. Mishra, C, Yamauchi, B. Mishra, C. Yamauchi
    ページ267-270
    ページ数4
    出版ステータスPublished - 2000
    イベントProceedings of the Second International Conference on Processing Materials for Properties - San Francisco, CA
    継続期間: 2000 11 52000 11 8

    Other

    OtherProceedings of the Second International Conference on Processing Materials for Properties
    CitySan Francisco, CA
    Period00/11/500/11/8

    ASJC Scopus subject areas

    • 工学(全般)

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