Pressure Dependence of Rate Coefficients for Formation and Dissociation of Pentachlorodisilane and Related Chemical Activation Reactions

Kaito Noda, Nílson Kunioshi*, Akio Fuwa

*この研究の対応する著者

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Four entrance channels to the pentachlorodisilane (Si2HCl5) potential energy well, namely, SiCl2 + SiHCl3, SiCl4 + SiHCl, Cl3SiSiCl + HCl, and SiCl3 + SiHCl2, were analyzed in detail through transition state theory, Rice–Ramsperger–Kassel–Marcus (RRKM) theory, and solution of the multichannel master equation. The stationary points in the potential energy surface were optimized, and their vibrational frequencies and rotational constants calculated at the (U)B3LYP/6–31+G(d,p) level of theory; the (U)CCSD(T)/aug-cc-pVTZ level was then used for accurate estimation of activation energies. The pressure and temperature dependence of the rate coefficients of the channels related to Si2HCl5 stabilization/dissociation was determined along a wide range of conditions, for the first time. All channels showed strong pressure dependence in the four cases, at least at low-to-moderate pressure conditions. Each entrance channel leads to the formation of different products under different conditions, and the mechanism was analyzed in detail. The results indicated that at atmospheric pressure the reactions are in the falloff region, and therefore do not support the adoption of high-pressure limit rate coefficients in reaction models designed for simulation of systems at atmospheric or subatmospheric pressure conditions.

本文言語English
ページ(範囲)584-595
ページ数12
ジャーナルInternational Journal of Chemical Kinetics
49
8
DOI
出版ステータスPublished - 2017 8月 1

ASJC Scopus subject areas

  • 生化学
  • 物理化学および理論化学
  • 有機化学
  • 無機化学

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