Production of nanopatterns by a combination of electron beam lithography and a self-assembled monolayer for an antibody nanoarray

Guo Jun Zhang, Takashi Tanii, Yuzo Kanari, Iwao Ohdomari

研究成果: Article査読

23 被引用数 (Scopus)

抄録

We report on a flexible method of producing antibody (IgG) nanopatterns by combining electron beam (EB) lithography and a perfluorodecyltriethoxysilane (FDTES) self-assembled monolayer (SAM). Using EB lithography of the FDTES SAM, we easily fabricated IgG patterns with feature sizes on the order of 100 nm. The patterned IgG retained its ability to interact specifically with an anti-lgG. The influence of different concentrations of the IgG and anti-IgG on the resulting fluorescent IgG arrays was investigated. These IgG nanopatterns appeared to be remarkably well controlled and showed almost no detectable nonspecific binding of proteins on a hydrophobic SAM under a suitable incubation condition, characterized by atomic force microscopy, and epi-fluorescence microscopy. The technique enables the realization of high-throughput protein nanoscale arrays with high specificity.

本文言語English
ページ(範囲)410-417
ページ数8
ジャーナルJournal of Nanoscience and Nanotechnology
7
2
DOI
出版ステータスPublished - 2007 2 1

ASJC Scopus subject areas

  • バイオエンジニアリング
  • 化学 (全般)
  • 生体医工学
  • 材料科学(全般)
  • 凝縮系物理学

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