Propagation characteristics of shear horizontal surface acoustic waves in (112̄0) ZnO film/silica glass substrate structures

Atsushi Tanaka*, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe

*この研究の対応する著者

研究成果: Article査読

25 被引用数 (Scopus)

抄録

This paper presents the propagation characteristics of the shear horizontal surface acoustic wave (SH-SAW) in ZnO (0°, 90°, ψ) (11 2̄ 0) textured ZnO films. ZnO (0°, 90°, 0°) film/interdigital transducer (IDT) electrode/silica glass substrate structures were fabricated by RF magnetron sputtering. Experimental results demonstrate that SH-SAW was clearly excited in these structures. We also theoretically estimated the electromechanical coupling coefficient K2 in the ZnO (0°, 90°, ψ) film/silica glass substrate structure. The theoretical results show that the IDT electrode/ZnO (0°, 90°, 55°) film/silica glass substrate structure had a relatively high K2 value of 3.4%. Moreover, the shear horizontal displacement component of the SH-SAW in this structure is much larger than the transverse and longitudinal displacement components. This structure could be used in SH-SAW sensors for evaluating the electrical properties of liquids.

本文言語English
ページ(範囲)2709-2713
ページ数5
ジャーナルIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
55
12
DOI
出版ステータスPublished - 2008 12月
外部発表はい

ASJC Scopus subject areas

  • 器械工学
  • 音響学および超音波学
  • 電子工学および電気工学

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