Properties of M-AFM Probe Affected by Coatings Nanostructural Metal

A. Hosoi*, M. Hamada, A. Fujimoto, Y. Ju

*この研究の対応する著者

研究成果

1 被引用数 (Scopus)

抄録

In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. The fabricated probe had a tip of 8 ìm high and curvature radius approximately 30 nm. The dimensions of the cantilever are 250×30×15 ìm. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam (FIB) fabrication. AFM topography of a grating sample was measured by using each fabricated probe. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tipof the probe by approaching an Au film sample.

本文言語English
ホスト出版物のタイトル2009 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, MEMS/MOEMS 2009
ページ197-201
ページ数5
出版ステータスPublished - 2009 9 23
外部発表はい
イベント2009 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, MEMS/MOEMS 2009 - Rome, Italy
継続期間: 2009 4 12009 4 3

出版物シリーズ

名前DTIP of MEMS and MOEMS - Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS

Conference

Conference2009 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, MEMS/MOEMS 2009
国/地域Italy
CityRome
Period09/4/109/4/3

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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