Properties of M-AFM probe affected by nanostructural metal coatings

A. Hosoi, M. Hamada, A. Fujimoto, Y. Ju

研究成果: Article

7 引用 (Scopus)

抜粋

In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.

元の言語English
ページ(範囲)1233-1237
ページ数5
ジャーナルMicrosystem Technologies
16
発行部数7
DOI
出版物ステータスPublished - 2010 7

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

フィンガープリント Properties of M-AFM probe affected by nanostructural metal coatings' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用