Properties of M-AFM probe affected by nanostructural metal coatings

A. Hosoi, M. Hamada, A. Fujimoto, Y. Ju*

*この研究の対応する著者

研究成果: Article査読

8 被引用数 (Scopus)

抄録

In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.

本文言語English
ページ(範囲)1233-1237
ページ数5
ジャーナルMicrosystem Technologies
16
7
DOI
出版ステータスPublished - 2010 7月
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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