PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino*, K. Hoh, M. Hirata, N. Atoda, S. Ichimura

*この研究の対応する著者

研究成果: Conference contribution

抄録

Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

本文言語English
ホスト出版物のタイトルJournal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
ページ232-236
ページ数5
3
1
DOI
出版ステータスPublished - 1984 1月
外部発表はい
イベントProc of the 1984 Int Symp on Electron, Ion, and Photon Beams - Tarrytown, NY, USA
継続期間: 1984 5月 291984 6月 1

Other

OtherProc of the 1984 Int Symp on Electron, Ion, and Photon Beams
CityTarrytown, NY, USA
Period84/5/2984/6/1

ASJC Scopus subject areas

  • 工学(全般)

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