PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino; K. Hoh; M. Hirata; N. Atoda; S. Ichimura

doi:10.1116/1.583234

PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

H. Tanino^*, K. Hoh, M. Hirata, N. Atoda, S. Ichimura

^*この研究の対応する著者

研究成果

抄録

Novel methods are proposed to enlarge the vertical (normal to the plane of electron orbit) width of the exposed area in synchrotron radiation (SR) lithography. They are the shaping of the cross section of the SR beam by a fixed toroidal mirror with specified parameters and the superposition of the reflected SR beams from fixed planar mirrors onto the upper and lower peripheries of the straight beam. An experimental verification is presented, and merits and demerits of these methods are compared with those of other methods.

本文言語	English
ホスト出版物のタイトル	Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
ページ	232-236
ページ数	5
巻	3
版	1
DOI	https://doi.org/10.1116/1.583234
出版ステータス	Published - 1984 1月
外部発表	はい
イベント	Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams - Tarrytown, NY, USA 継続期間: 1984 5月 29 → 1984 6月 1

Other

Other	Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams
City	Tarrytown, NY, USA
Period	84/5/29 → 84/6/1

ASJC Scopus subject areas

工学（全般）

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10.1116/1.583234

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Tanino, H, Hoh, K, Hirata, M, Atoda, N & Ichimura, S 1984, PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY. in Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena. 1 edn, vol. 3, pp. 232-236, Proc of the 1984 Int Symp on Electron, Ion, and Photon Beams, Tarrytown, NY, USA, 84/5/29. https://doi.org/10.1116/1.583234

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AU - Ichimura, S.

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PROPOSALS AND EXPERIMENTS ON LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY.

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