PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST.

Y. Tabata*, S. Tagawa, M. Washio

*この研究の対応する著者

研究成果: Conference contribution

19 被引用数 (Scopus)

抄録

Recently, chloromethylated polystyrene (CMS), a highly sensitive, high resolution electron resist with excellent dry etching durability, was developed. Very recently reactive intermediates in irradiated polystyrene, which is a starting material of CMS, have been studied and the transient absorption spectra of excimer, triplet states, charge-transfer complexes, and radical cations of polystyrene have been measured. The present paper describes the cross-linking mechanism of the high sensitivity CMS resist and compares it to that of polystyrene on the basis of data on reactive intermediates of polystyrene and CMS.

本文言語English
ホスト出版物のタイトルACS Symposium Series
編集者L.F. Thompson, C.G. Willson, J.M.J. Frechet
出版社ACS
ページ151-163
ページ数13
266
ISBN(印刷版)0841208719
出版ステータスPublished - 1984
外部発表はい

出版物シリーズ

名前ACS Symposium Series
番号266
ISSN(印刷版)0097-6156

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)

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