Ratio of transverse diffusion coefficient to mobility of electrons in high-pressure xenon and xenon doped with hydrogen

Shingo Kobayashi*, Nobuyuki Hasebe, Takehiro Hosojima, Takeshi Ishizaki, Kazuhiro Iwamatsu, Mitsuteru Mimura, Takashi Miyachi, Mitsuhiro Miyajima, Kirill Pushkin, Chikara Tezuka, Tadayoshi Doke, Masanori Kobayashi, Eido Shibamura, Akihiro Ishizuka

*この研究の対応する著者

    研究成果: Article査読

    13 被引用数 (Scopus)

    抄録

    We have obtained the ratio of the transverse diffusion coefficient to the mobility of electrons multiplied by the elementary charge, in Xe and Xe + H 2 under electric fields at a higher pressure of 1 MPa in comparison with those in preceding experiments. The results show that the density effect (nonlinear effect) of the ratio in both pure Xe and Xe + H2 is ≤15% below 1 MPa over the reduced electric field range from 0.08 to 0.6 × 10-17 V·cm2. We also found that the diffusion of an electron swarm is suppressed by adding trace amount of hydrogen to high-pressure xenon gas. We discuss the application of Xe + H2 gas to a new gamma-ray camera.

    本文言語English
    ページ(範囲)7894-7900
    ページ数7
    ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    45
    10 A
    DOI
    出版ステータスPublished - 2006 10月 15

    ASJC Scopus subject areas

    • 物理学および天文学(その他)

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