Redox Reactions at Cu,Ag/Ta2O5 Interfaces and the Effects of Ta2O5 Film Density on the Forming Process in Atomic Switch Structures
Tohru Tsuruoka*, Ilia Valov, Stefan Tappertzhofen, Jan Van Den Hurk, Tsuyoshi Hasegawa, Rainer Waser, Masakazu Aono
*この研究の対応する著者
研究成果: Article › 査読
131
被引用数
(Scopus)