Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence

Seung Jun Yu, Yoshimichi Ohki, Makoto Fujimaki*, Koichi Awazu, Junji Tominaga, Kimikazu Sasa, Tetsuro Komatsubara

*この研究の対応する著者

研究成果: Article査読

4 被引用数 (Scopus)

抄録

Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7 dB was obtained, indicating that the method is effective for reducing polarization dependent loss.

本文言語English
ページ(範囲)4762-4765
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
266
21
DOI
出版ステータスPublished - 2008 11月 1

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学

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