Reduction in polarization dependent loss of a planar lightwave circuit by ion-implantation-induced birefringence

Seung Jun Yu, Yoshimichi Ohki, Makoto Fujimaki, Koichi Awazu, Junji Tominaga, Kimikazu Sasa, Tetsuro Komatsubara

研究成果: Article

4 引用 (Scopus)

抜粋

Reduction in polarization dependent loss of a planar lightwave circuit was achieved by asymmetric birefringence formed by ion implantation, in which oxygen ions were implanted along a diagonal of a cross-section of the planar lightwave circuit. The induced birefringence has a slow axis along the line perpendicular to the diagonal. In the present research, a decrease in polarization dependent loss of up to 3.7 dB was obtained, indicating that the method is effective for reducing polarization dependent loss.

元の言語English
ページ(範囲)4762-4765
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
266
発行部数21
DOI
出版物ステータスPublished - 2008 11 1

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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