抄録
Measurement of the real part of the refractive index (nf′) of silicon thin films using a slab optical waveguide (SOW) is discussed. Upon deposition of thin films on a SOW, the transmittance decreases with periodic oscillation owing to the multiple reflection. It is clarified from a simulation of a four-layer SOW that the period of oscillation is reduced when nf′ increases. In this paper, we discuss a method of determining the nf′ from correspondence of the minimum film thickness (d0) in which the oscillation valley appears as a calculation result of transmittance for the TE0 mode to d0 in an experiment in which the refractive index and sizes of SOW are known without considering higher modes or the TM mode. Good agreement is observed in comparison of the result of the measurement with that of the ellipsometer at a wavelength of 632.8 nm. Therefore, it can be shown that the distributions of nf′ of a-Si:H and SiN thin films at wavelengths from 400 to 800 nm are obtained in the same manner. In order to achieve higher accuracy of the measurement, a SOW with a larger refractive index is used.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 920-925 |
| ページ数 | 6 |
| ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| 巻 | 36 |
| 発行部数 | 2 |
| 出版物ステータス | Published - 1997 |
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ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
- Engineering(all)
これを引用
Refractive index measurement of silicon thin films using slab optical waveguides. / Takezawa, Naganori; Kato, Isamu; Nojima, Shinji.
：: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 巻 36, 番号 2, 1997, p. 920-925.研究成果: Article
}
TY - JOUR
T1 - Refractive index measurement of silicon thin films using slab optical waveguides
AU - Takezawa, Naganori
AU - Kato, Isamu
AU - Nojima, Shinji
PY - 1997
Y1 - 1997
N2 - Measurement of the real part of the refractive index (nf′) of silicon thin films using a slab optical waveguide (SOW) is discussed. Upon deposition of thin films on a SOW, the transmittance decreases with periodic oscillation owing to the multiple reflection. It is clarified from a simulation of a four-layer SOW that the period of oscillation is reduced when nf′ increases. In this paper, we discuss a method of determining the nf′ from correspondence of the minimum film thickness (d0) in which the oscillation valley appears as a calculation result of transmittance for the TE0 mode to d0 in an experiment in which the refractive index and sizes of SOW are known without considering higher modes or the TM mode. Good agreement is observed in comparison of the result of the measurement with that of the ellipsometer at a wavelength of 632.8 nm. Therefore, it can be shown that the distributions of nf′ of a-Si:H and SiN thin films at wavelengths from 400 to 800 nm are obtained in the same manner. In order to achieve higher accuracy of the measurement, a SOW with a larger refractive index is used.
AB - Measurement of the real part of the refractive index (nf′) of silicon thin films using a slab optical waveguide (SOW) is discussed. Upon deposition of thin films on a SOW, the transmittance decreases with periodic oscillation owing to the multiple reflection. It is clarified from a simulation of a four-layer SOW that the period of oscillation is reduced when nf′ increases. In this paper, we discuss a method of determining the nf′ from correspondence of the minimum film thickness (d0) in which the oscillation valley appears as a calculation result of transmittance for the TE0 mode to d0 in an experiment in which the refractive index and sizes of SOW are known without considering higher modes or the TM mode. Good agreement is observed in comparison of the result of the measurement with that of the ellipsometer at a wavelength of 632.8 nm. Therefore, it can be shown that the distributions of nf′ of a-Si:H and SiN thin films at wavelengths from 400 to 800 nm are obtained in the same manner. In order to achieve higher accuracy of the measurement, a SOW with a larger refractive index is used.
KW - a-Si:H
KW - MPCVD
KW - Optical fiber sensor
KW - Refractive index
KW - SiN
KW - Slab optical waveguide
KW - Thin film
UR - http://www.scopus.com/inward/record.url?scp=0031069239&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0031069239&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:0031069239
VL - 36
SP - 920
EP - 925
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 2
ER -