RELIABILITY OF NANO-METER THICK MULTI-LAYER DIELECTRIC FILMS ON POLY-CRYSTALLINE SILICON.

Y. Ohji, T. Kusaka, I. Yoshida, A. Hiraiwa, K. Yagi, K. Mukai, O. Kasahara

研究成果: Conference contribution

38 被引用数 (Scopus)

抄録

The use of a double-layer dielectric film (SiO//2/Si//3N//4) on poly-Si is proposed as a way to achieve the reduced thickness films needed to scale down VLSIs. The oxidation of Si//3N//4 reduces leakage current and defect density. It is shown that a double-layer film with a thinner top oxide layer is harder to break down, so, the thickness of the top oxide layer must be reduced in order to increase the reliability of double-layer dielectrics. Moreover, there are no edge effects on the reliability of double-layer dielectric films due to the patterned poly-Si electrode. These results, confirm that SiO//2/Si//3N//4 is a highly reliable nanometer-thick dielectric for use on poly-Si.

本文言語English
ホスト出版物のタイトルAnnual Proceedings - Reliability Physics (Symposium)
出版社IEEE
ページ55-59
ページ数5
出版ステータスPublished - 1987
外部発表はい

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Safety, Risk, Reliability and Quality

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