Retexturing under self-occlusion using hierarchical markers

Shoki Miyagawa, Yoshihiro Fukuhara, Fumiya Narita, Norihiro Ogata, Shigeo Morishima

    研究成果: Conference contribution

    1 引用 (Scopus)

    抜粋

    Marker-based retexturing is to superimpose the texture on a target object by detecting and identifying markers from within the captured image. We propose a new marker that can be identified under a large deformation that involves self-occlusion, which was not taken into consideration in the following markers. Bradley et al. [Bradley et al. 2009] designed the independent markers, but it is difficult to recognize them under complicated occlusion. Scholz et al.[Scholz and Magnor 2006] created a circular marker with a single color selected from multiple colors. They created ID corresponding to the alignment of colors by one marker and the markers around it and identified by placing the marker so that the ID would be unique. However, when some markers are covered by self-occlusion, the positional relationship of the markers appears to be different from the original, so markers near the self-occlusion are failed to identify. Narita et al. [Narita et al. 2017] considered self-occlusion by improving the identification algorithm. They succeeded in improving the accuracy of identification by creating triangle meshes whose vertices are the center of gravity of markers and assuming that they are close to a right isosceles triangle. However, since outliers are removed using angles, identification of markers may fail in the case of the object that is likely to be deformed in the shear direction like a cloth. Therefore, we considered self-occlusion by designing hierarchical markers so that they can be refferred to in a global scope. We designed a color based marker for easy recognition even at low resolution.

    元の言語English
    ホスト出版物のタイトルACM SIGGRAPH 2017 Posters, SIGGRAPH 2017
    出版者Association for Computing Machinery, Inc
    ISBN(電子版)9781450350150
    DOI
    出版物ステータスPublished - 2017 7 30
    イベント44th International Conference on Computer Graphics and Interactive Techniques, ACM SIGGRAPH 2017 - Los Angeles, United States
    継続期間: 2017 7 302017 8 3

    Other

    Other44th International Conference on Computer Graphics and Interactive Techniques, ACM SIGGRAPH 2017
    United States
    Los Angeles
    期間17/7/3017/8/3

    ASJC Scopus subject areas

    • Computer Vision and Pattern Recognition
    • Software
    • Computer Graphics and Computer-Aided Design

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  • これを引用

    Miyagawa, S., Fukuhara, Y., Narita, F., Ogata, N., & Morishima, S. (2017). Retexturing under self-occlusion using hierarchical markers. : ACM SIGGRAPH 2017 Posters, SIGGRAPH 2017 [a27] Association for Computing Machinery, Inc. https://doi.org/10.1145/3102163.3102247