RHEED intensity oscillation of C60 layer epitaxial growth

Jiro Nishinaga*, Atsushi Kawaharazuka, Yoshiji Horikoshi

*この研究の対応する著者

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Intensity oscillations of reflection high-energy electron diffraction are observed during a C60 layer epitaxial growth on GaAs (1 1 1)B, (1 1 4)A and (1 1 4)B substrates. Frequencies of the oscillations coincide well with growth rates of C60 layers, suggesting that C60 layers grow by layer-by-layer growth mode as with GaAs and other semiconductor materials. Anomalous oscillations are observed in the initial stage of a C60 layer growth on GaAs (1 1 1)B surface with (2×2) reconstruction. These oscillations indicate that the C60 first-layer growth is completed at approximately half monolayer coverage. This phenomenon is explained by a model that C60 adsorption sites are limited due to As-trimers adsorbed on GaAs surface. Clear oscillations are observed during a C60 layer growth on GaAs (1 1 4)A substrate, and X-ray diffraction peaks of the layer are sharp. In contrast, no oscillation is detected during the growth on the (1 1 4)B substrate, and these layers exhibit poor X-ray diffraction characteristics. Thus, the C60 epitaxial layer growth on GaAs substrates is strongly affected by the GaAs surface reconstruction and polarity.

本文言語English
ページ(範囲)2227-2231
ページ数5
ジャーナルJournal of Crystal Growth
311
7
DOI
出版ステータスPublished - 2009 3月 15

ASJC Scopus subject areas

  • 凝縮系物理学
  • 材料化学
  • 無機化学

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