Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza, Kentaro Ishibashi*, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

*この研究の対応する著者

研究成果査読

6 被引用数 (Scopus)

抄録

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

本文言語English
ページ(範囲)06FH211-06FH213
ジャーナルJapanese journal of applied physics
48
6 PART 2
DOI
出版ステータスPublished - 2009 6 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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