Si - O - Si strained bond and paramagnetic defect centers induced by mechanical fracturing in amorphous SiO2
Shuji Munekuni*, Nobuyuki Dohguchi, Hiroyuki Nishikawa, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama
*この研究の対応する著者
研究成果: Article › 査読
25
被引用数
(Scopus)