抜粋
A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl<inf>4</inf> has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K<inf>2</inf>SiF<inf>6</inf> system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an E<inf>q</inf>E<inf>r</inf> (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10<sup>-5</sup> cm<sup>2</sup> s<sup>-1</sup> at 923 K by chronoamperometry.
| 元の言語 | English |
|---|---|
| ページ（範囲） | D444-D448 |
| ジャーナル | Journal of the Electrochemical Society |
| 巻 | 162 |
| 発行部数 | 9 |
| DOI | |
| 出版物ステータス | Published - 2015 6 26 |
ASJC Scopus subject areas
- Electrochemistry
- Electronic, Optical and Magnetic Materials
- Materials Chemistry
- Surfaces, Coatings and Films
- Renewable Energy, Sustainability and the Environment
- Condensed Matter Physics
フィンガープリント Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Maeda, K., Yasuda, K., Nohira, T., Hagiwara, R., & Homma, T. (2015). Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions. Journal of the Electrochemical Society, 162(9), D444-D448. https://doi.org/10.1149/2.0441509jes