TY - JOUR
T1 - Silicon electrodeposition in water-soluble KF-KCl molten salt
T2 - Investigations on the reduction of Si(IV) ions
AU - Maeda, Kazuma
AU - Yasuda, Kouji
AU - Nohira, Toshiyuki
AU - Hagiwara, Rika
AU - Homma, Takayuki
N1 - Publisher Copyright:
© 2015 The Electrochemical Society. All rights reserved.
PY - 2015/6/26
Y1 - 2015/6/26
N2 - A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.
AB - A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.
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U2 - 10.1149/2.0441509jes
DO - 10.1149/2.0441509jes
M3 - Article
AN - SCOPUS:84937027317
VL - 162
SP - D444-D448
JO - Journal of the Electrochemical Society
JF - Journal of the Electrochemical Society
SN - 0013-4651
IS - 9
ER -