Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions

Kazuma Maeda; Kouji Yasuda; Toshiyuki Nohira; Rika Hagiwara; Takayuki Homma

doi:10.1149/2.0441509jes

Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions

Kazuma Maeda, Kouji Yasuda, Toshiyuki Nohira, Rika Hagiwara, Takayuki Homma

研究成果: Article › 査読

31 被引用数 (Scopus)

抄録

A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl<inf>4</inf> has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K<inf>2</inf>SiF<inf>6</inf> system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an E<inf>q</inf>E<inf>r</inf> (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.

本文言語	English
ページ（範囲）	D444-D448
ジャーナル	Journal of the Electrochemical Society
巻	162
号	9
DOI	https://doi.org/10.1149/2.0441509jes
出版ステータス	Published - 2015 6 26

ASJC Scopus subject areas

Electrochemistry
Electronic, Optical and Magnetic Materials
Materials Chemistry
Surfaces, Coatings and Films
Renewable Energy, Sustainability and the Environment
Condensed Matter Physics

文献へのアクセス

10.1149/2.0441509jes

フィンガープリント「Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル

@article{1c5287689cf94fd8b48c0b3e80ba4ff7,

title = "Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions",

abstract = "A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.",

author = "Kazuma Maeda and Kouji Yasuda and Toshiyuki Nohira and Rika Hagiwara and Takayuki Homma",

year = "2015",

month = jun,

day = "26",

doi = "10.1149/2.0441509jes",

language = "English",

volume = "162",

pages = "D444--D448",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

number = "9",

}

TY - JOUR

T1 - Silicon electrodeposition in water-soluble KF-KCl molten salt

T2 - Investigations on the reduction of Si(IV) ions

AU - Maeda, Kazuma

AU - Yasuda, Kouji

AU - Nohira, Toshiyuki

AU - Hagiwara, Rika

AU - Homma, Takayuki

PY - 2015/6/26

Y1 - 2015/6/26

N2 - A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.

AB - A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.

UR - http://www.scopus.com/inward/record.url?scp=84937027317&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84937027317&partnerID=8YFLogxK

U2 - 10.1149/2.0441509jes

DO - 10.1149/2.0441509jes

M3 - Article

AN - SCOPUS:84937027317

VL - 162

SP - D444-D448

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 9

ER -