Silicon electrodeposition in water-soluble KF-KCl molten salt: Investigations on the reduction of Si(IV) ions

Kazuma Maeda, Kouji Yasuda, Toshiyuki Nohira, Rika Hagiwara, Takayuki Homma

    研究成果: Article

    22 引用 (Scopus)

    抄録

    A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl<inf>4</inf> has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K<inf>2</inf>SiF<inf>6</inf> system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an E<inf>q</inf>E<inf>r</inf> (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10<sup>-5</sup> cm<sup>2</sup> s<sup>-1</sup> at 923 K by chronoamperometry.

    元の言語English
    ページ(範囲)D444-D448
    ジャーナルJournal of the Electrochemical Society
    162
    発行部数9
    DOI
    出版物ステータスPublished - 2015 6 26

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    molten salts
    Silicon
    Electrodeposition
    electrodeposition
    Molten materials
    Salts
    Ions
    Electrolytes
    Water
    molten salt electrolytes
    silicon
    water
    Chronoamperometry
    ions
    Electrons
    electroplating
    Electroplating
    Cyclic voltammetry
    electron transfer
    purity

    ASJC Scopus subject areas

    • Electrochemistry
    • Electronic, Optical and Magnetic Materials
    • Materials Chemistry
    • Surfaces, Coatings and Films
    • Renewable Energy, Sustainability and the Environment
    • Condensed Matter Physics

    これを引用

    Silicon electrodeposition in water-soluble KF-KCl molten salt : Investigations on the reduction of Si(IV) ions. / Maeda, Kazuma; Yasuda, Kouji; Nohira, Toshiyuki; Hagiwara, Rika; Homma, Takayuki.

    :: Journal of the Electrochemical Society, 巻 162, 番号 9, 26.06.2015, p. D444-D448.

    研究成果: Article

    Maeda, Kazuma ; Yasuda, Kouji ; Nohira, Toshiyuki ; Hagiwara, Rika ; Homma, Takayuki. / Silicon electrodeposition in water-soluble KF-KCl molten salt : Investigations on the reduction of Si(IV) ions. :: Journal of the Electrochemical Society. 2015 ; 巻 162, 番号 9. pp. D444-D448.
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    abstract = "A new method for electroplating Si using a water-soluble KF-KCl molten salt electrolyte and high-purity gaseous SiCl4 has been proposed. To gain a fundamental understanding of the process, the electrodeposition of Si from Si(IV) complex ions on a Ag electrode in a molten KF-KCl-K2SiF6 system was investigated by cyclic voltammetry at 923 K. The reduction of Si(IV) ions to metallic Si was observed as a single 4-electron wave, which is explained by an EqEr (quasireversible-reversible electron transfer reactions) mechanism. The diffusion coefficient of the Si(IV) ions in the electrolyte was determined to be 3.2 × 10-5 cm2 s-1 at 923 K by chronoamperometry.",
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    AU - Yasuda, Kouji

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    AU - Hagiwara, Rika

    AU - Homma, Takayuki

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