Simple method for fabrication of diamond nanowires by inductively coupled plasma reactive ion etching

Kentaro Wakui, Yuya Yonezu, Takao Aoki, Masahiro Takeoka, Kouichi Semba

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Diamond nanowires are fabricated on a bulk, single crystalline diamond near an edge of aluminum coating using inductively coupled plasma reactive ion etching. Two different density areas are simultaneously appeared where the dense area has 9 times higher density than that of the sparse area while keeping the size of nanowires almost uniform in these areas. The nanowire sizes realized in the dense (sparse) area are 858 ± 22nm (876 ± 25nm) in height and 126 ± 6 nm (124 ± 7 nm) in diameter, which is suitable for applications in optical quantum information processing.

本文言語English
論文番号058005
ジャーナルJapanese journal of applied physics
56
5
DOI
出版ステータスPublished - 2017 5

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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