Small changes in work function of the TiC(001) surface with chemisorption of O2 and H2O

C. Oshima; T. Tanaka; M. Aono; R. Nishitani; S. Kawai; F. Yajima

doi:10.1063/1.90949

Small changes in work function of the TiC(001) surface with chemisorption of O₂ and H₂O

C. Oshima^*, T. Tanaka, M. Aono, R. Nishitani, S. Kawai, F. Yajima

^*この研究の対応する著者

研究成果: Article › 査読

21 被引用数 (Scopus)

抄録

Changes in work function of the TiC (001) surface have been measured against O₂ and H₂O exposure by using photoelectron spectroscopy. The sticking rates are about 1/100 of those for elemental Ti-metal substrate. In the case of oxygen exposure, the work function increases monotonically from 3.8 to 4.2 eV, whereas for H₂O a maximum value of work function occurs at an exposure of ∼300L, and its value finally reaches 4.5 eV.

本文言語	English
ページ（範囲）	822-823
ページ数	2
ジャーナル	Applied Physics Letters
巻	35
号	10
DOI	https://doi.org/10.1063/1.90949
出版ステータス	Published - 1979

ASJC Scopus subject areas

物理学および天文学（その他）

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10.1063/1.90949

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引用スタイル

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AU - Kawai, S.

AU - Yajima, F.

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AB - Changes in work function of the TiC (001) surface have been measured against O2 and H2O exposure by using photoelectron spectroscopy. The sticking rates are about 1/100 of those for elemental Ti-metal substrate. In the case of oxygen exposure, the work function increases monotonically from 3.8 to 4.2 eV, whereas for H2O a maximum value of work function occurs at an exposure of ∼300L, and its value finally reaches 4.5 eV.

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