Spatial distribution of defects in high-purity silica glasses

Ryoichi Tohmon, Akihiro Ikeda, Yasushi Shimogaichi, Shuji Munekuni, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama

研究成果: Article査読

15 被引用数 (Scopus)

抄録

The spatial distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between silica manufactured by different methods. Furthermore, the defects induced by ionizing radiation or ultraviolet light have a spatial distribution relative to the geometry of the as-manufactured boule, suggesting that these defects arise primarily from the activation of preexisting precursors.

本文言語English
ページ(範囲)1302-1306
ページ数5
ジャーナルJournal of Applied Physics
67
3
DOI
出版ステータスPublished - 1990 12 1

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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