Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam

H. Nishikawa, K. Fukagawa, T. Nakamura, Y. Ohki, M. Oikawa, T. Kamiya, K. Arakawa

研究成果: Article査読

8 被引用数 (Scopus)

抄録

High-purity silica glass was irradiated by a focused 15-MeV O4+ microbeam with diameter of 1 μm up to a fluence of 1.0 × 10 14 ions/cm2. Spatial distribution of irradiation effects by the O4+ microbeam on silica glass was investigated by optical microscopy, microphotoluminescence (PL)/Raman spectroscopy and atomic force microscopy (AFM). Distribution of refractive index change and defect formation was visualized by optical microscopy and PL mapping, indicating the structural changes of silica glass along the ion track up to the depth of 10 μm. In addition, we observed deformed side surface with a groove by AFM along the track suggesting the internal compaction in silica glass. This is accompanied by increased threefold rings of SiO2 network detected by Raman scattering. We also discuss technological implications of these results on the applications of microbeam irradiation effects to the fabrication of microoptical elements.

本文言語English
ページ(範囲)437-440
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
242
1-2
DOI
出版ステータスPublished - 2006 1

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学

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