Spontaneous Crack Healing in Nanostructured Silica-Based Thin Films

Shun Itoh, Satoshi Kodama, Maho Kobayashi, Shintaro Hara, Hiroaki Wada, Kazuyuki Kuroda, Atsushi Shimojima

研究成果: Article査読

10 被引用数 (Scopus)

抄録

Self-healing materials that can spontaneously repair damage under mild conditions are desirable in many applications. Significant progress has recently been made in the design of polymer materials capable of healing cracks at the molecular scale using reversible bonds; however, such a self-healing mechanism has rarely been applied to rigid inorganic materials. Here, we demonstrate the self-healing ability of lamellar silica-based thin films formed by self-assembly of silica precursors and quaternary ammonium-type surfactants. Specifically, spontaneous healing of cracks (typically less than 1.5 μm in width) was achieved under humid conditions even at room temperature. The randomly oriented lamellar structure with thin silica layers is suggested to play an essential role in crack closure and the reformation of siloxane networks on the fracture surface. These findings will lead to the creation of smart self-healing silica-based materials based on reversible siloxane bonds.

本文言語English
ページ(範囲)10289-10294
ページ数6
ジャーナルACS Nano
11
10
DOI
出版ステータスPublished - 2017 10 24

ASJC Scopus subject areas

  • 材料科学(全般)
  • 工学(全般)
  • 物理学および天文学(全般)

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