Structural properties of sulfur-implanted diamond single crystals

Masataka Hasegawa*, Masahiko Ogura, Daisuke Takeuchi, Sadanori Yamanaka, Hideyuki Watanabe, Sung Gi Ri, Naoto Kobayashi, Hideyo Okushi

*この研究の対応する著者

研究成果

1 被引用数 (Scopus)

抄録

The lattice location of sulfur implanted into diamond single crystals has been investigated using particle induced X-ray emission and ion channeling. Sulfur atoms were implanted into high-quality undoped homoepitaxial diamond (100) film grown by microwave plasma assisted chemical vapor deposition onto high-temperature and high-pressure synthetic lb diamond (100) substrates, as well as into lb diamond substrates directly, at 400°C up to the concentration of 1 × 1020/cm3. They were annealed at 800°C in vacuum for 100inin after the implantation. Sulfur dopant was found to occupy preferentially substitutional sites in the host lattice. The possible maximum displacement of sulfur dopant was 0.14A from 〈001〉 axis, and 0.07A from 〈011〉 axis. The substitutional fraction of sulfur was 0.5 and 0.7 along 〈001〉 and along 〈011〉 direction, respectively. The depth profile of sulfur distribution measured by SIMS coincides with that of simulated vacancy depth profile associated with the sulfur implantation, rather than expected dopant distribution. These results suggest the redistribution of sulfur, and possible sulfur-residual damage (vacancy) coupling in the diamond crystal after the implantation.

本文言語English
ホスト出版物のタイトルProceedings of the International Conference on Ion Implantation Technology
ページ773-776
ページ数4
DOI
出版ステータスPublished - 2000
外部発表はい
イベント2000 13th International Conference on Ion Implantation Technology, IIT 2000 - Alpbach
継続期間: 2000 9 172000 9 22

Other

Other2000 13th International Conference on Ion Implantation Technology, IIT 2000
CityAlpbach
Period00/9/1700/9/22

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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