Structure of hetero-epitaxial nickel film on iron-substrate by electrodeposition

Kazuhito Kamei*

*この研究の対応する著者

研究成果: Article査読

4 被引用数 (Scopus)

抄録

With special attention to the fine structure of Ni film and the structure of Ni/a-Fe interface, the hetero-epitaxial growth of Ni electrodeposits on polycrystalline a-Fe has been studied mainly by transmission electron microscopy. (1) Ni grows hetero-epitaxially even under a high current density as 500 A/m2 on a cleaned substrate surface. (2) The crystallographic orientation relationship between Ni deposits and the substrate a-Fe is almost the same as that of the Kurdjumov-Sachs relationship. (3) the Ni hetero-epitaxial film consists of columnar crystals which grow in the direction and contains dislocations and stacking faults with high density. (4) These defects are introduced in order to decrease the elastic strain caused by the misfit between Ni and a-Fe at the interface. The number of defects decreases with increasing film thickness.

本文言語English
ページ(範囲)743-748
ページ数6
ジャーナルNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
52
8
出版ステータスPublished - 1988 8
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)

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