Photosensitivity of Ge-doped SiO2 glass is closely related to defect formation with ultraviolet photon irradiation. In the present paper, optical properties of Ge oxygen deficient centers, which are involved in the defect formation, are reviewed. Furthermore, structures and generation mechanisms of the photo-induced defects are discussed.
|ジャーナル||Diffusion and Defect Data. Pt A Defect and Diffusion Forum|
|出版ステータス||Published - 2000 1月 1|
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