Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama; Akihiro Oshima; Hiroki Yamamoto; Seiichi Tagawa; Masakazu Washio

doi:10.1143/APEX.4.076501

Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama, Akihiro Oshima, Hiroki Yamamoto, Seiichi Tagawa, Masakazu Washio

先進理工学部

研究成果: Article › 査読

15 被引用数 (Scopus)

抄録

The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm^-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

本文言語	English
論文番号	076501
ジャーナル	Applied Physics Express
巻	4
号	7
DOI	https://doi.org/10.1143/APEX.4.076501
出版ステータス	Published - 2011 7

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

文献へのアクセス

10.1143/APEX.4.076501

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引用スタイル

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AU - Washio, Masakazu

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