Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama*, Akihiro Oshima, Hiroki Yamamoto, Seiichi Tagawa, Masakazu Washio

*この研究の対応する著者

研究成果: Article査読

17 被引用数 (Scopus)

抄録

The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

本文言語English
論文番号076501
ジャーナルApplied Physics Express
4
7
DOI
出版ステータスPublished - 2011 7月

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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