Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama; Akihiro Oshima; Hiroki Yamamoto; Seiichi Tagawa; Masakazu Washio

doi:10.1143/APEX.4.076501

Study on positive-negative inversion of chlorinated resist materials

Tomoko Gowa Oyama^*, Akihiro Oshima, Hiroki Yamamoto, Seiichi Tagawa, Masakazu Washio

^*この研究の対応する著者

先進理工学部

研究成果: Article › 査読

17 被引用数 (Scopus)

抄録

The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm^-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

本文言語	English
論文番号	076501
ジャーナル	Applied Physics Express
巻	4
号	7
DOI	https://doi.org/10.1143/APEX.4.076501
出版ステータス	Published - 2011 7月

ASJC Scopus subject areas

工学（全般）
物理学および天文学（全般）

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10.1143/APEX.4.076501

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abstract = "The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.",

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AU - Oyama, Tomoko Gowa

AU - Oshima, Akihiro

AU - Yamamoto, Hiroki

AU - Tagawa, Seiichi

AU - Washio, Masakazu

PY - 2011/7

Y1 - 2011/7

N2 - The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

AB - The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.

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Study on positive-negative inversion of chlorinated resist materials

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