The chlorinated resist materials ZEP520A and ZEP7000 (ZEON Co.) are changed from positive-tone to negative-tone by high dose electron beam (EB) and ion beam irradiation. Here, the reaction mechanisms of the positive-negative inversion induced by EB were attempted to be clarified with ultraviolet-visible (UV-vis) spectroscopy and X-ray photoelectron spectroscopy. The results indicated that dissociative electron attachment would be induced in response to the irradiation dose. For high dose irradiation (>5mC cm-2), it was suggested that crosslinking would become predominant because of the structural changes in the resists and the lower scission ratio due to the decrease of the chlorine.
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