TY - JOUR
T1 - Study on reactive sputtering to deposit transparent conductive amorphous In2O3-ZnO films using an In-Zn alloy target
AU - Tsukamoto, Naoki
AU - Sensui, Sakae
AU - Jia, Junjun
AU - Oka, Nobuto
AU - Shigesato, Yuzo
N1 - Funding Information:
This work was partially supported by the New Energy and Industrial Technology Development Organization (NEDO) as a project of the “Development of High-Efficiency Lighting Based on the Organic Light-Emitting Mechanism.”
Copyright:
Copyright 2014 Elsevier B.V., All rights reserved.
PY - 2014/5/30
Y1 - 2014/5/30
N2 - Amorphous indium-zinc-oxide films were deposited in the "transition region" by reactive sputtering using an In-Zn alloy target with a specially designed double feedback system. The cathode voltage showed a V- and circle-shaped curve as a function of O2 gas flow in the transition region, which differs from the S-shaped curve in Berg's model for reactive sputtering depositions. In-situ analyses with a quadrupole mass spectrometer combined with an energy analyzer revealed that the negative ions O-, O2-, InO-, and InO2-, with high kinetic energies corresponding to the cathode voltage, were generated at the partially oxidized target surface. Furthermore the positive ions O +, Ar+, In+, and Zn+ with rather low kinetic energies (around 10 eV) were confirmed to be generated by the charge exchange of sputtered neutral O, Ar, In and Zn atoms, respectively.
AB - Amorphous indium-zinc-oxide films were deposited in the "transition region" by reactive sputtering using an In-Zn alloy target with a specially designed double feedback system. The cathode voltage showed a V- and circle-shaped curve as a function of O2 gas flow in the transition region, which differs from the S-shaped curve in Berg's model for reactive sputtering depositions. In-situ analyses with a quadrupole mass spectrometer combined with an energy analyzer revealed that the negative ions O-, O2-, InO-, and InO2-, with high kinetic energies corresponding to the cathode voltage, were generated at the partially oxidized target surface. Furthermore the positive ions O +, Ar+, In+, and Zn+ with rather low kinetic energies (around 10 eV) were confirmed to be generated by the charge exchange of sputtered neutral O, Ar, In and Zn atoms, respectively.
KW - Energetic negative ions
KW - In-situ analysis
KW - Positive ions
KW - Reactive sputtering
KW - Transparent conducting oxide
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U2 - 10.1016/j.tsf.2013.10.109
DO - 10.1016/j.tsf.2013.10.109
M3 - Article
AN - SCOPUS:84899570289
VL - 559
SP - 49
EP - 52
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -