Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE Mold

Tomohiro Takahashi*, Yuya Takasawa, Tomoko Gowa, Satoshi Okubo, Takashi Sasaki, Takaharu Miura, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

*この研究の対応する著者

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Nano-/micro-scale structures of crosslinked polytetrafluoroethylene (RX-PTFE) have been directly fabricated by focused ion beam (FIB). In this study, the nano-/micro-fabricated RX-PTFE were attempted to be applied for the polymeric molds of nanoimprint lithography (NIL). The ability of the RX-PTFE mold for electron beam NIL (EB-NIL) was evaluated by the imprinted patterns, and compared with ultraviolet NIL (UV-NIL) method. The RX-PTFE molds and the imprinted structures obtained by UV- /EB-NIL were observed by a field emission scanning electron microscope (FE-SEM) and a scanning electron microscope (SEM). The height of imprinted structures was 860 nm, and the thinnest line width achieved in the experiments showed 180 nm with EB-NIL process. The estimated aspect ratio was 4.8.

本文言語English
ページ(範囲)69-74
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
23
1
DOI
出版ステータスPublished - 2010

ASJC Scopus subject areas

  • ポリマーおよびプラスチック
  • 有機化学
  • 材料化学

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